Micro/Nanofabrication Instruments

Clean Room

The Class-100 clean room is over 1400 ft² and is housed on the third floor of the MRL. The clean room provides chemicals and equipment for doing lithography and wet chemistry processes for micro structures as well as multi-layer devices.

Deposition Tools

Atomic layer deposition (Cambridge Nanotech)
ATC 2000 custom four gun Co-sputtering system (AJA International). Current Configuration.
Thermal Evaporation (Common Wealth Scientific)
Thermal Evaporation (Cooke)
E-Beam Evaporation System (Temescal, qty. 2) Current Configuration.
PECVD (PlasmaTherm/Unaxis SLR730)

Dry Etching Tools

O₂ Plasma Etch/Asher (LFE)
Reactive Ion Etch (Unaxis/Plasma Therm)
8cm Ion Mill (Common Wealth Scientific)

Lithography Tools

MJB3 Mask Aligner (Suss Microtech, qty. 4)
UV Exposure System (Oriel)
SEM E-beam writer (Nabity/JEOL 6400)
Nano engineering workstation (eLine RAITH)

Bulk Crystal Growth

Float Zone furnace (CSI)
Crystalox furnace

Diffusion/Annealing Furnaces

6" Tube oxidation furnace
2" Tube oxidation furnace
2" Tube Inert gas annealing furnace
High Temperature CM furnace
Rapid thermal annealing furnace (Custom)
Box furnace (qty. 3)

Bonding Stations

4524 Au Wire Ball Bonder (K&S)
Al Wire Wedge Bonder (K&S)
Ball bonding reference (.PPT & .DOC) from K&S

Probe Stations

Temperature Controlled Vacuum Probe Station (Lake Shore/Desert Cryo)
DC Bench Top Probe Station (Custom)
4155c Semiconductor Parameter Analyzer (Agilent), used with Lake Shore & custom probe station
RF-1 Probe Station (Cascade)
E5062A Network Analyzer (Agilent)

Other Resources

Optical Microscopes with CCD cameras
Wet Etch Stations
Wafer Spinners
Nano Tube Growth furnace (Custom)
Plannarization
N₂ Glove Box Fabrication System (Mbraun)