The FSMRL Micro/Nanofabrication Facility is a multidisciplinary user-supported facility providing equipment and resources for deposition of thin film material and the fabrication of patterned micro- and nano-sized structures including SQUIDs, MEMs, nanotube, flexible and other multi-layer electronic devices.
The facility operates a 1400 ft2 class-100 cleanroom with a 400 ft2 nano-science cleanroom that is integrated within over 3000 ft2
of additional instrumentation and tools. The facility provides mulitple
high-vacuum PVD and Etching systems combined with high precision
optical lithography and e-beam lithography tools capable of 5 nanometer
line resolution allowing state of the art pattern delineation and
device fabrication.
New instrument: Thermogravimetric Analysis (TGA) and Differential Scanning Calorimetry (DSC)